Wafers with the highest surface quality

The first class surface of the wafers as well as best warp and TTV values make the DS 261 the leading wire saw in the semi-conductor industry. It‘s compact and solid construction guarantee highest process stability on a small footprint. With it‘s technological and qualitative performance the DS 261 is in particular used for cutting 12 inch wafers.

  • Fast and efficient cutting
  • Best warp and TTV values
  • Maximum nano-topological values
  • Integrated workpiece orientation


Wide range of applications - Maximum yield

Besides silicon, the versatile DS 261 wire saw also cuts other hard and brittle materials such as quartz, sapphire or gallium arsenide in different dimensions. The high quality standard of the DS261 guarnatees maximum yield and best nano-topological values.

Description Specifications
Workpiece dimensions max. ø 305 mm (12")
Loading length 400 mm
Area of wire ø   0,100 — 0,175 mm
Cutting medium slurry
Machine dimensions, l x w x h   4109 × 2929 × 3325 mm
Machine weight 12000 kg
Connection capacity 50 kW
Voltage / frequency 3 × 400 V / 50 Hz ; 3 × 480 V / 60 Hz
Compressed air 4 — 7 bar
Coolant water
Discharge air indispensable
Slurry management   option
Air-conditioned room indispensable

Description Example 1 Example 2
Wafer size 305 mm (12'') 203 mm (8'')
Loading length 400 mm 400 mm
Wafer thickness 950 µm 830 µm
Wire thickness 160 µm 160 µm
Number of wafer per year* ~160 · 103 ~330 · 103
* depends on customer's productions parameters